Course details of EP 427 - Thin Film Physics & Technology

Course Name Thin Film Physics & Technology
Total Credits 6
Type T
Lecture 3
Tutorial 0
Practical 0
Selfstudy 0
Half Semester N
Prerequisite
Text Reference K.L. Chopra, Thin Film Phenomena, Mcgraw Hill, 1968. M. Ohring, Materials sciences of Thin Films, Academic Press, 1992 D.L. Smith, Thin Film Deposition: Principles and Practice, Mcgraw Hill, 1995. J. E. Mahan, Physical Vapour Deposition, John Wiley, 2000. Surface Science, K.W. Kolasinski, John Wiley, 2002. J.H. Fendler, Nanoparticles and Nanostructured Films, Springer, 2000.
Description Vacuum technology, gas transport and pumping systems, pressure measurements. Physical and chemical vapour deposition processes, sputtering and Plasma CVD, deposition by electron beams, arc plasma and pulsed laser. Molecular beam Epitaxy and metal-organic CVD. Chemical solution based deposition processes, electrochemical deposition, Langmuir Blodgett and self assembly processes. Physics of thin film deposition, adsoption, surface deposition, nucleation growth and structure development. Surface structure, role of surfaces. Epitaxial growth, lattice mismatch, strain, growth modes, self organization, self aligned structures, heterostructures, multilayer superlattice structures. Patterning techniques for IC, MEMS and other device fabrication. Application of thin films.
Last Update 18-08-2011 12:35:57.774368